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表面和薄膜过程导论

表面和薄膜过程导论

作者:(英)John A.Venables著

出版社:世界图书出版公司北京公司

出版时间:2003-01-01

ISBN:9787506265553

定价:¥76.00

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内容简介
  表面和薄膜科学是微电子、光电子和磁工业的物理基础,是现代社会技术进步的科学保证。在微观以至原子水平上研究和操纵表面让我们能够理解许多具有重要技术意义之器件的制作与运行。本书关注发生在表面和薄膜中的物理过程,详细介绍了与表面和薄膜相关的物理过程,包括热力学与运动学的理论基础,洁净表面的制备和表面的表征与分析技术,表面吸附与脱附过程,金属和半导体表面性质,外延生长和薄膜器件的表面过程等等内容。本书是作者积长期在欧洲和美国的大学从事电子显微学和表面科学的研究与教学实践的丰富经验而写成的,是一本优秀的研究生教科书。本书叙述条理清楚,语言流畅,每章末有习题和相关的参考文献,书末给出了大量的参考文献,附录中介绍了查阅相关资料的互联网网址。读者对象:物理学、化学、材料科学和材料工程方面的科研人员和研究生。此书为英文版!
作者简介
暂缺《表面和薄膜过程导论》作者简介
目录
Preface
Chapter 1 Introduction to surface processes
1.1 Elementary thermodynamic ideas of surfaces
1.2 Suface energies and the Wulff throrem
1.3 Thermodynamics versus kinetics
1.4 Introduction to surface and adsorbate reconstructions
1.5 Introduction to surface electronics
Further reading for chapter1
Problems for chapter 1
Chapter 2 Surfaces in vacuum ultra-high vacuum techniques and processes
2.1 Kinetic thery concepts
2.2 Vacum concepts
2.3 UHV hardware:pumps,tubes,materials and pressure measureent
2.4 Surface rpeparation and cleaning procedures in situ experiments
2.5 Thin film deposition procedures:sources of information
Further reading for chapter2
Problems for chapter2
Chapter 3 Electron-based techniques for examinnig surface and thin film processes
3.1 Classification of suface and microsopy techniques
3.2 Diffraction and quasi-elastie scattering techniques
3.3 Inlastic scattering techniques;chemical and electronic state information
3.4 Quantification of Auger spectra
3.5 Microsopy-spectroscopy SEM SAM SPM etc.
Further reading for chapter3
Problems talks and projects for chapter 3
Chapter 4 Surface processes in adsorption
Chapter 5 Surface processes in epitaxial growth
Chapter 6 Electronic structure and processes at metalic surfaces
Chapter 7 Semiconductor surfaces and interfaces
Chapter 8 Surface procces in thin film devices
Chapter 9 Postscript-where do we go from here?
Rerferences
Index
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